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"Lapisan tipis indium timah oksida (ITO) dideposisikan pada substrat gelas corning dengan metode sputtering menggunakan gas argon. Parameter deposisi dan penambahan oksigen dalam gas sputtering dioptimasi untuk mendapatkan tingkat transparansi lapisan tertinggi dan resistivitas listrik terendah melalui pengamatan struktur, sifat listrik dan sifat optik. Peningkatan laju deposisi dan ketebalan lapisan menghasilkan perubahan orientasi kristalografi dari (222) ke (400) dan (440), serta peningkatan kekasaran permukaan lapisan. Pemanasan substrat sangat diperlukan untuk mendapatkan lapisan tipis dengan kristalinitas yang lebih baik. Nilai resistivitas lapisan cenderung naik dengan penambahan oksigen hingga 2% dalam gas sputtering , dengan nilai resistivitas terendah sebesar 5.36 x 10-4Ω?cm dapat dicapai pada ketebalan lapisan 750 nm. Semua lapisan tipis yang dideposisi pada penelitian ini menunjukkan transparansi lebih dari 85% sehingga memungkinkan untuk diaplikasikan pada divais fotovoltaik dan display.

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Indium tin oxide (ITO) films were sputtered on corning glass substrate. Oxygen admixture and sputtering deposition parameters were optimized to obtain the highest transparency as well as lowest resistivity. Structural, electrical and optical properties of the films were then examined. In creasing deposition rate and film thickness changed the crystallographic orientation from (222) to (400) and (440), as well as higher surface roughness. It was necessary to apply substrate heating during reposition to get films with better crystallinity. The lowest resistivity of 5.36 x 10-4Ω?cm was obtained at 750 nm film thickness. The films resistivity was increased by addition of oxygen up to 2% in the argon sputtering gas. All films showed over 85% transmittance in the visible wavelength range, possible for applications in photovoltaic and display devices."

"Indeks bias (n) dan koefi sien absorpsi optis (α) lapisan tipis amorf silikon karbon terhidrogenasi (a-SiC:H) telah diteliti dari hasil pengukuran refl eksi dan transmisi. Lapisan tipis a-SiC:H dihasilkan dengan metode deposisi dc sputtering menggunakan target silikon dalam campuran gas argon dan metan. Indeks bias (n) berkurang dengan peningkatan fl ow rate gas metan. Koefi sien absorpsi optis (α) bergeser ke energi yang lebih tinggi dengan bertambahnya fl ow rate gas metan. Lapisan tipis cenderung makin tidak teratur dan memiliki gap optis yang lebih lebar pada fl ow rate gas metan tinggi. Relasi komposisi terhadap sifat?sifat optik lapisan tipis akan didiskusikan demikianpula terhadap ketidakteraturan jaringan amorf.

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Methane Flow Rate Effects On The Optical Properties of Amorphous Silicon Carbon (a-SiC:H) Films Deposited By DC Sputtering Methods. We have investigated the refractive index (n) and the optical absorption coeffi cient (α) from refl ection and transmission measurements on hydrogenated amorphous silicon carbon (a-SiC:H) fi lms. The a-SiC:H fi lms were prepared by dc sputtering method using silicon target in argon and methane gas mixtures. The refractive index (n) decreases as the methane fl ow rate increase. The optical absorption coeffi cient (α) shifts to higher energy with increasing methane fl ow rate. At higher methane fl ow rate, the fi lms tend to be more disorder and have wider optical gap. The relation of the optical properties and the disorder amorphous network with the compositional properties will be discussed."

"Telah dibuat lapisan tipis In2O3: Sn (ITO) dengan metode DC Magnetron Sputtering diatas substrat soda-lime yang mudah diperoleh dan murah. Hasil pengujian menunjukkan bahwa nilai resistivitas tidak homogen pada suatu permukaan lapisan tipis. Resisitivitas minimum diperoleh bernilai 1.6 x 10-4 Ω cm. Resistivitas minimum ini umumnya diperoleh pada titik pengukuran yang berjarak 40 mm sumbu x negatif, 27 mm sumbu y negatif dari titik pada sampel yang berada tepat di atas titik pusat target. Struktur mikro menunjukkan preferred orientation pada (400). Ukuran batas butir lebih mempengaruhi resistivitas. Umumnya grain yang besar akan memiliki nilai resistivitas yang kecil.

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In2O3 :Sn (ITO) thin film has been using DC Magnetron Sputtering method on soda-lime substrate which is easy to get and the price is cheap. The result show the inhomogeniety of resistivity value on the surface of thin fim. The minimum resistivity is 1.6 x 10 -4Ω cm. This value is generally obtained at the point of which is 40 mm to the left, 27 mm down of a point at the sample which is exactly on top of the target center point. The microstructure shows preferred orientation at (400), but resistivity is not depend on this. This value is determined more of the size of grain boundary. Generally, a bigger grain will result in a smaller value of resistivity. It is hypothesized that the conductivity process is caused by donors which are localized at grain boundaries. This hypothesis explained which shows the amount of grain is increase, resistivity will decrease."